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Конференції - Поточні - EOSAM2016

Location: Adlershof con. vent. Exhibition Centre - Rudower Chaussee, 17 - 12489 Berlin, Germany,
Duration: 26 September 2016 - 30 September 2016
Submission Deadline: 30 April 2016

TOM 1- Silicon Photonics and Guided-Wave Optics
TOM 2- Freeform Optics
TOM 3- Optical System Design and Tolerancing
TOM 4 – Diffractive Optics
TOM 5 - Trends in Resonant Nanophotonics
TOM 6- Frontiers in Optical Metrology
TOM 7- Organic & Hybrid Semiconductor Materials and Devices
TOM8 - Adaptive Optics and Advanced Illumination Imaging

Deadline for abstract submission: 30 April 2016 Notification to authors: 15 June 2016

Abstracts can only be submitted online via Conftool: www.conftool.com/eosam2016 Authors are requested to submit an extended abstract of two pages with at least one figure. The abstract must be formatted according to the EOS abstract guidelines, which can be downloaded here. You might wish to use either the Word or LaTeX template. Contributions will be accepted for oral and poster presentations (please indicate your preference). At least one author is requested to register for the meeting separately from the abstract submission. The registration includes admission to all Topical Meetings, sessions and additional program.

JOURNAL PAPERS IN JEOS:RP Presenters at an EOS Topical Meeting are kindly invited to consider the submission of a manuscript about their research to the EOS open-access on-line journal JEOS: RP (Journal of the European Optical Society, Rapid Publications, www.jeos.org). A 20% discount will be applied to the author fee. JEOS:RP publishes articles about recent scientific research and technological innovation as well as review papers about a topic in science or innovation from the recent past. A contribution should be original and will be subjected to the journal’s standard anonymous peer review process for scientific quality. The average time-to-publication of the journal is of the order of 75 days.

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